Invention Grant
- Patent Title: High electron mobility transistor
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Application No.: US16574094Application Date: 2019-09-18
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Publication No.: US11355626B2Publication Date: 2022-06-07
- Inventor: Yu-Ming Hsu , Yu-Chi Wang , Yen-Hsing Chen , Tsung-Mu Yang , Yu-Ren Wang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: CN201910788603.5 20190826
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/205 ; H01L29/267 ; H01L29/15 ; H01L29/20 ; H01L29/04

Abstract:
An HEMT includes an aluminum gallium nitride layer. A gallium nitride layer is disposed below the aluminum gallium nitride layer. A zinc oxide layer is disposed under the gallium nitride layer. A source electrode and a drain electrode are disposed on the aluminum gallium nitride layer. A gate electrode is disposed on the aluminum gallium nitride layer and between the drain electrode and the source electrode.
Public/Granted literature
- US20210066487A1 HIGH ELECTRON MOBILITY TRANSISTOR Public/Granted day:2021-03-04
Information query
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