The invention relates to a method for optimizing a shearing bench for shearing a film having a thickness less than or equal to 10 microns, the shearing bench comprising a plurality of elements, each element being characterized by a plurality of parameters, the collection of parameters forming the parameters of the shearing bench, the plurality of elements comprising at least one blade assembly comprising a blade and a counter-blade collaborating with the blade, a system for progressing the film, and a system for urging the blade and the counter-blade against one another in order to shear the film.