- Patent Title: Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition
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Application No.: US16499196Application Date: 2018-03-28
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Publication No.: US11358974B2Publication Date: 2022-06-14
- Inventor: Sung Gi Kim , Jeong Joo Park , Joong Jin Park , Se Jin Jang , Byeong-il Yang , Sang-Do Lee , Sam Dong Lee , Sang Ick Lee , Myong Woon Kim
- Applicant: DNF CO., LTD.
- Applicant Address: KR Daejeon
- Assignee: DNF CO., LTD.
- Current Assignee: DNF CO., LTD.
- Current Assignee Address: KR Daejeon
- Agency: McCoy Russell LLP
- Priority: KR10-2017-0040078 20170329,KR10-2018-0034940 20180327
- International Application: PCT/KR2018/003643 WO 20180328
- International Announcement: WO2018/182305 WO 20181004
- Main IPC: C07F7/02
- IPC: C07F7/02 ; C23C16/30 ; C23C16/34 ; H01L21/02 ; C23C16/50 ; C23C16/455 ; C23C16/32 ; C23C16/36 ; C23C16/40 ; C07F7/10 ; C08G77/62 ; C08L83/14
Abstract:
Provided are a silylamine compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition, and more particularly, to a silylamine compound capable of being usefully used as a precursor of a silicon-containing thin film, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing a silicon-containing thin film using the composition.
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