Invention Grant
- Patent Title: Cleaning formulation for removing residues on surfaces
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Application No.: US17582077Application Date: 2022-01-24
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Publication No.: US11359169B2Publication Date: 2022-06-14
- Inventor: Tomonori Takahashi , Bing Du , William A. Wojtczak , Thomas Dory , Emil A. Kneer
- Applicant: Fujifilm Electronic Materials U.S.A., Inc.
- Applicant Address: US RI N. Kingstown
- Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee: Fujifilm Electronic Materials U.S.A., Inc.
- Current Assignee Address: US RI N. Kingstown
- Agency: Fish & Richardson P.C.
- Main IPC: C11D7/50
- IPC: C11D7/50 ; C11D11/00 ; C11D7/32 ; C11D3/00 ; H01L21/02 ; H01L21/311 ; H01L21/027
Abstract:
This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion; and 5) water. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
Public/Granted literature
- US20220145222A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES Public/Granted day:2022-05-12
Information query
