Invention Grant
- Patent Title: Cleaning method and film deposition method
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Application No.: US16666621Application Date: 2019-10-29
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Publication No.: US11359279B2Publication Date: 2022-06-14
- Inventor: Hitoshi Kato , Makoto Ishigo , Jun Sato
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: IPUSA, PLLC
- Priority: JPJP2018-210060 20181107
- Main IPC: C23C16/44
- IPC: C23C16/44 ; H01J37/32 ; H01L21/02
Abstract:
A cleaning method for dry cleaning a susceptor disposed in a process chamber of a film deposition apparatus is provided. In the method, a protective member is placed on a substrate receiving region provided in the susceptor. A cleaning gas is supplied to the susceptor having the protective member placed on the substrate receiving region, thereby removing a film deposited on a surface of the susceptor by etching.
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