Variations in photoelectric conversion performance between pixels (valid pixels and light-shielding pixels) in an imaging element are reduced. A solid-state imaging element includes: a plurality of pixels including a color filter for transmitting a light having a predetermined wavelength among incident lights, a photoelectric conversion portion formed on a semiconductor substrate and for performing photoelectric conversion in accordance with a light transmitted through the color filter, and an insulating layer placed between the color filter and the semiconductor substrate; light-shielding pixels among the plurality of pixels, including a first light-shielding portion disposed in a vicinity of the color filter on the insulating layer and for shielding the light transmitted through the color filter in its own pixel; and a second light-shielding portion disposed on the insulating layer between the plurality of pixels and the light-shielding pixels, and for shielding a light transmitted through the color filter of the adjacent pixel.