Invention Grant
- Patent Title: High thermal stability SiOx doped GeSbTe materials suitable for embedded PCM application
-
Application No.: US16833349Application Date: 2020-03-27
-
Publication No.: US11362276B2Publication Date: 2022-06-14
- Inventor: Huai-Yu Cheng , Hsiang-Lan Lung
- Applicant: MACRONIX INTERNATIONAL CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee: MACRONIX INTERNATIONAL CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Andrew L. Dunlap
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L23/12 ; H01L23/488 ; G11C11/56 ; H01L27/24

Abstract:
A phase-change material having specific SiOx doping into special Ge-rich GexSbyTez material is described. Integrated circuits using this phase-change material as memory elements in a memory array can pass the solder bonding criteria mentioned above, while exhibiting good set speeds and demonstrating good 10 year data retention characteristics. A memory cell described herein comprises a first electrode and a second electrode; and a memory element in electrical series between the first and second electrode. The memory element comprises a GexSbyTez phase change material with a silicon oxide additive, including a combination of elements having Ge in a range of 28 to 36 at %, Sb in a range of 10 to 20 at %, Te in a range of 25 to 40 at %, Si in a range of 5 to 10 at %, and O in a range of 12 to 23 at %.
Public/Granted literature
- US20210305507A1 HIGH THERMAL STABILITY SiOX DOPED GeSbTe MATERIALS SUITABLE FOR EMBEDDED PCM APPLICATION Public/Granted day:2021-09-30
Information query
IPC分类: