Invention Grant
- Patent Title: Gas laser device
-
Application No.: US17439815Application Date: 2019-05-17
-
Publication No.: US11367988B2Publication Date: 2022-06-21
- Inventor: Tatsuya Yamamoto , Junichi Nishimae , Yuzuru Tadokoro , Masashi Naruse , Takuya Kawashima
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Xsensus LLP
- International Application: PCT/JP2019/019786 WO 20190517
- International Announcement: WO2020/234944 WO 20201126
- Main IPC: H01S3/034
- IPC: H01S3/034 ; H01S3/13

Abstract:
A gas laser device includes a shielding plate that is a first shielding member, and a shielding plate that is a second shielding member. The first shielding member includes a first opening, and a second opening. A laser beam that is to be propagated to discharge regions passes through the first opening. The laser beam that has taken a round trip through the discharge regions after passing through the first opening passes through the second opening. The second shielding plate faces the first shielding member the discharge regions located therebetween. The shielding plate includes an opening that is a third opening. The laser beam that has been propagated through the first opening and the discharge regions, and the laser beam that is to be propagated to the second opening through the discharge regions pass through the third opening. A plane shape of the third opening includes a rectilinear segment.
Public/Granted literature
- US20220094129A1 GAS LASER DEVICE Public/Granted day:2022-03-24
Information query