Invention Grant
- Patent Title: Diamond composite CMP pad conditioner
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Application No.: US15481443Application Date: 2017-04-06
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Publication No.: US11370082B2Publication Date: 2022-06-28
- Inventor: Prashant G. Karandikar , Michael K. Aghajanian , Edward Gratrix , Brian J. Monti
- Applicant: M Cubed Technologies, Inc.
- Applicant Address: US CT Newtown
- Assignee: M Cubed Technologies, Inc.
- Current Assignee: M Cubed Technologies, Inc.
- Current Assignee Address: US CT Newtown
- Agency: Blank Rome LLP
- Main IPC: B24B53/017
- IPC: B24B53/017 ; B24B53/12

Abstract:
A chemical-mechanical polishing/planarization pad conditioner body made from diamond-reinforced reaction bonded silicon carbide, with diamond particles protruding or “standing proud” of the rest of the surface, and uniformly distributed on the cutting surface. In one embodiment, the diamond particles are approximately uniformly distributed throughout the composite, but in other embodiments they are preferentially located at and near the conditioning surface. The tops of the diamond particles can be engineered to be at a constant elevation (i.e., the conditioner body can be engineered to be very flat). Exemplary shapes of the body may be disc or toroidal. The diamond particles can be made to protrude from the conditioning surface by preferentially eroding the Si/SiC matrix. The eroding may be accomplished by electrical discharge machining or by lapping/polishing with abrasive.
Public/Granted literature
- US20170291279A1 Diamond Composite CMP Pad Conditioner Public/Granted day:2017-10-12
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