Invention Grant
- Patent Title: Abrasive grains, evaluation method therefor, and wafer manufacturing method
-
Application No.: US16348345Application Date: 2017-09-07
-
Publication No.: US11373858B2Publication Date: 2022-06-28
- Inventor: Makoto Funayama
- Applicant: SUMCO Corporation
- Applicant Address: JP Tokyo
- Assignee: SUMCO Corporation
- Current Assignee: SUMCO Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greenblum & Bernstein, P.L.C.
- Priority: JPJP2016-219393 20161110
- International Application: PCT/JP2017/032249 WO 20170907
- International Announcement: WO2018/088009 WO 20180517
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B28D5/04 ; C09K3/14

Abstract:
Provided are abrasive grains, an evaluation method and a wafer manufacturing method. A predetermined amount of abrasive grains is prepared as an abrasive grain sample group, the grain diameter of individual abrasive grains in the abrasive grain sample group is measured, the number of abrasive grains in the abrasive grain sample group as a whole is counted, abrasive grains having a grain diameter equal to or smaller than a predetermined reference grain e diameter criterion which is smaller than the average grain diameter of the abrasive grain sample are defined as small grains and the number of the small grains is counted, a small grain ratio is calculated as the number ratio of the small grains occupied in the abrasive grain sample group as a whole, and a determination is made as to whether or not the small grain ratio is equal to or smaller than a predetermined threshold value.
Public/Granted literature
- US20200058484A1 ABRASIVE GRAINS, EVALUATION METHOD THEREFOR, AND WAFER MANUFACTURING METHOD Public/Granted day:2020-02-20
Information query
IPC分类: