Invention Grant
- Patent Title: Method of manufacturing a silicon carbide device and wafer composite including laser modified zones in a handle substrate
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Application No.: US16869033Application Date: 2020-05-07
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Publication No.: US11373863B2Publication Date: 2022-06-28
- Inventor: Roland Rupp , Mihai Draghici , Tobias Franz Wolfgang Hoechbauer , Wolfgang Lehnert , Matteo Piccin
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102019111985.5 20190508
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B23K26/00 ; H01L21/60

Abstract:
A wafer composite includes a handle substrate, an auxiliary layer formed on a first main surface of the handle substrate, and a silicon carbide structure formed over the auxiliary layer. The handle substrate is subjected to laser radiation that modifies crystalline material along a focal plane in the handle substrate. The focal plane is parallel to the first main surface. The auxiliary layer is configured to stop propagation of microcracks that the laser radiation may generate in the handle substrate.
Information query
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