Invention Grant
- Patent Title: Package substrate and manufacturing method having a mesh gas-permeable structure disposed in the through hole
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Application No.: US16683266Application Date: 2019-11-14
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Publication No.: US11373927B2Publication Date: 2022-06-28
- Inventor: Chin-Sheng Wang , Ra-Min Tain , Pei-Chang Huang
- Applicant: Unimicron Technology Corp.
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: JCIPRNET
- Priority: TW107118580 20180530,TW108136042 20191004
- Main IPC: H01L23/367
- IPC: H01L23/367 ; H01L23/42 ; H01L23/498 ; H01L23/18 ; H01L23/467 ; H01L23/14 ; H01L21/48 ; H01L23/00

Abstract:
A package substrate includes a multilayer circuit structure, a gas-permeable structure, a heat conducting component, a first circuit layer, a second circuit layer and a build-up circuit structure. The gas-permeable structure and the heat conducting component are respectively disposed in a first and a second through holes of the multilayer circuit structure. The first and the second circuit layers are respectively disposed on an upper and a lower surfaces of the multilayer circuit structure and expose a first and a second sides of the gas-permeable structure. The build-up circuit structure is disposed on the first circuit layer and includes at least one patterned photo-imageable dielectric layer and at least one patterned circuit layer alternately stacked. The patterned circuit layer is electrically connected to the first circuit layer by at least one opening. The build-up circuit structure and the first circuit layer exposed by a receiving opening form a recess.
Public/Granted literature
- US20200083142A1 PACKAGE SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2020-03-12
Information query
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