Invention Grant
- Patent Title: Array substrate having protection region on same layer as gate insulating layer and manufacturing method thereof
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Application No.: US16498008Application Date: 2019-04-15
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Publication No.: US11374038B2Publication Date: 2022-06-28
- Inventor: Ming Xiang , Xing Ming
- Applicant: WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Applicant Address: CN Hubei
- Assignee: WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee: WUHAN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO., LTD.
- Current Assignee Address: CN Hubei
- Agent Mark M. Friedman
- Priority: CN201910100218.7 20190131
- International Application: PCT/CN2019/082641 WO 20190415
- International Announcement: WO2020/155399 WO 20200806
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/027 ; H01L29/786 ; H01L29/66 ; H01L21/3115

Abstract:
An array substrate and a manufacturing method thereof, wherein the array substrate includes a substrate; an active layer disposed on the substrate; a gate insulating layer disposed on the active layer; a gate disposed on the gate insulating layer; and a protection region dispose between the active layer and the gate, wherein the protection region is disposed on two sides of the gate and disposed on a same layer as the gate insulating layer.
Public/Granted literature
- US20200251504A1 ARRAY SBUSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2020-08-06
Information query
IPC分类: