Invention Grant
- Patent Title: Inspection system and inspection method to qualify semiconductor structures
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Application No.: US17129686Application Date: 2020-12-21
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Publication No.: US11378532B2Publication Date: 2022-07-05
- Inventor: Brett Lewis , Wilhelm Kuehn , Deying Xia , Shawn McVey , Ulrich Mantz
- Applicant: Carl Zeiss SMT GmbH , Carl Zeiss Microscopy, LLC
- Applicant Address: DE Oberkochen; US NY Thornwood
- Assignee: Carl Zeiss SMT GmbH,Carl Zeiss Microscopy, LLC
- Current Assignee: Carl Zeiss SMT GmbH,Carl Zeiss Microscopy, LLC
- Current Assignee Address: DE Oberkochen; US NY Thornwood
- Agency: Fish & Richardson P.C.
- Priority: DE102018212403.5 20180725
- Main IPC: G01N23/2258
- IPC: G01N23/2258 ; H01J37/26 ; H01J49/14 ; H01L21/67
Abstract:
An inspection system serves to qualify semiconductor structures. The inspection system has an ion beam source for space-resolved exposition of the structures to be qualified with an ion beam. The inspection system also includes a secondary ion detection device with a mass spectrometer. The mass spectrometer is configured to measure an ion mass to charge ratio in a given bandwidth.
Public/Granted literature
- US20210109046A1 INSPECTION SYSTEM AND INSPECTION METHOD TO QUALIFY SEMICONDUCTOR STRUCTURES Public/Granted day:2021-04-15
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