Invention Grant
- Patent Title: Coating processing apparatus, coating processing method, and storage medium
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Application No.: US16313524Application Date: 2017-06-06
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Publication No.: US11378728B2Publication Date: 2022-07-05
- Inventor: Fumihiko Ikeda
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Venjuris, P.C.
- Priority: JPJP2016-129710 20160630
- International Application: PCT/JP2017/020963 WO 20170606
- International Announcement: WO2018/003426 WO 20180104
- Main IPC: B05C5/02
- IPC: B05C5/02 ; G02B5/30
Abstract:
A coating processing apparatus that applies a coating liquid containing an optical material includes a substrate holder that holds a substrate, a coating nozzle that ejects the coating liquid to the substrate held by the substrate holder, and a moving mechanism that relatively moves the substrate holder and the coating nozzle in an orthogonal direction.
Public/Granted literature
- US20200012025A1 COATING PROCESSING APPARATUS, COATING PROCESSING METHOD, AND STORAGE MEDIUM Public/Granted day:2020-01-09
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