Invention Grant
- Patent Title: Illumination system and projection apparatus
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Application No.: US17211747Application Date: 2021-03-24
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Publication No.: US11378875B2Publication Date: 2022-07-05
- Inventor: Chien-Chung Liao , Hung-Wei Liu
- Applicant: Coretronic Corporation
- Applicant Address: TW Hsin-Chu
- Assignee: Coretronic Corporation
- Current Assignee: Coretronic Corporation
- Current Assignee Address: TW Hsin-Chu
- Agency: JCIPRNET
- Priority: CN202020836073.5 20200519
- Main IPC: G03B21/20
- IPC: G03B21/20 ; G03B21/14 ; G03B27/48 ; H04N9/31 ; G02B27/48

Abstract:
An illumination system including a first excitation light source, a second excitation light source and a first diffusion element is provided. The first excitation light source emits a first excitation light beam, and the second excitation light source emits a second excitation light beam. The first and second excitation light beams have different colors. The first diffusion element is disposed on transmission paths of the first excitation light beam and the second excitation light beam, and the first diffusion element includes a first diffusion region and a second diffusion region with different diffusion degrees, wherein at least one of the first excitation light beam and the second excitation light beam sequentially passes through the first diffusion region and the second diffusion region. A projection apparatus is also provided. The illumination system of the invention effectively mitigates a speckle phenomenon of the excitation light beams to achieve a better optical efficiency.
Public/Granted literature
- US20210364901A1 ILLUMINATION SYSTEM AND PROJECTION APPARATUS Public/Granted day:2021-11-25
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