Invention Grant
- Patent Title: Salt, acid generator, resist composition and method for producing resist pattern
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Application No.: US16377965Application Date: 2019-04-08
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Publication No.: US11378883B2Publication Date: 2022-07-05
- Inventor: Yukako Anryu , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Buchanan, Ingersoll & Rooney PC
- Priority: JPJP2018-077036 20180412
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/038 ; C08L33/10 ; C08L33/14 ; C08L33/08 ; G03F7/031

Abstract:
A salt represented by formula (I): In formula (I), R1, R2, R3 and R4 each independently represent a halogen atom or a perfluoroalkyl group having 1 to 6 carbon atoms, R5, R6 and R7 each independently represent a halogen atom, a hydroxy group, a fluorinated alkyl group having 1 to 6 carbon atoms or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl group may be replaced by —O— or —CO—, m5 represents an integer of 0 to 3, m6 represents an integer of 0 to 3, m7 represents an integer of 0 to 3, R8 and R9 each independently represent a hydrogen atom or an alkyl group having 1 to 12 carbon atoms, and —CH2— included in the alkyl group may be replaced by —O— or —CO—, and Al− represents an organic anion.
Public/Granted literature
- US20220206383A2 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2022-06-30
Information query
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