Invention Grant
- Patent Title: Laser annealing device and thin film crystallization and dehydrogenation method using same
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Application No.: US16997454Application Date: 2020-08-19
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Publication No.: US11380544B2Publication Date: 2022-07-05
- Inventor: Dong-Min Lee , Ji-Hwan Kim , Jongoh Seo , Byung Soo So
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Lewis Roca Rothgerber Christie LLP
- Priority: KR10-2019-0101145 20190819
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/67 ; H01L21/268

Abstract:
A laser annealing device includes a stage, a laser generator, and a reflective member. The stage supports a substrate with a thin film formed thereon to be processed, and may be moved in a first direction at a set or predetermined speed. The laser generator irradiates a first area of the thin film with a laser beam while the stage is moved. The reflective member reflects a part of the laser beam, which is reflected from the first area of the thin film, to a second area of the thin film. The first area and the second area are spaced apart from each other.
Public/Granted literature
- US20210057218A1 LASER ANNEALING DEVICE AND THIN FILM CRYSTALLIZATION METHOD USING SAME Public/Granted day:2021-02-25
Information query
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