Invention Grant
- Patent Title: Apparatus and methods for determining wafer characters
-
Application No.: US17208850Application Date: 2021-03-22
-
Publication No.: US11380570B2Publication Date: 2022-07-05
- Inventor: Wei-Da Kang , Wen-Ting Tsai
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Duane Morris LLP
- Main IPC: H01L21/68
- IPC: H01L21/68 ; H01L23/544 ; H01L21/677 ; H05K13/08

Abstract:
Apparatus and methods for determining wafer characters are disclosed. In one example, an apparatus is disclosed. The apparatus includes: a processing tool configured to process a semiconductor wafer; a device configured to read an optical character disposed on the semiconductor wafer while the semiconductor wafer is located at the apparatus for wafer fabrication; and a controller configured to determine whether the optical character matches a predetermined character corresponding to the semiconductor wafer based on the optical character read in real-time at the apparatus.
Public/Granted literature
- US20210233791A1 APPARATUS AND METHODS FOR DETERMINING WAFER CHARACTERS Public/Granted day:2021-07-29
Information query
IPC分类: