- Patent Title: Device and system for decomposing and oxidizing gaseous pollutant
-
Application No.: US17140756Application Date: 2021-01-04
-
Publication No.: US11406934B2Publication Date: 2022-08-09
- Inventor: Chee-Wei Chan
- Applicant: SIW ENGINEERING PTE. LTD.
- Applicant Address: SG Kallang
- Assignee: SIW ENGINEERING PTE. LTD.
- Current Assignee: SIW ENGINEERING PTE. LTD.
- Current Assignee Address: SG Kallang
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: B01D53/34
- IPC: B01D53/34 ; B01D21/26 ; B01D47/14 ; B01D53/38 ; B01D53/76 ; F23G7/06
Abstract:
The invention provides a device and system for decomposing and oxidizing of gaseous pollutants. A novel reaction portion reduces particle formation in fluids during treatment, thereby improving the defect of particle accumulation in a reaction portion. Also, the system includes the device, wherein a modular design enables the system to have the advantage of easy repair and maintenance.
Public/Granted literature
- US20210121823A1 DEVICE AND SYSTEM FOR DECOMPOSING AND OXIDIZING GASEOUS POLLUTANT Public/Granted day:2021-04-29
Information query
IPC分类:
