Invention Grant
- Patent Title: Method for etching a phosphate source using acid
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Application No.: US16637254Application Date: 2018-08-10
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Publication No.: US11407640B2Publication Date: 2022-08-09
- Inventor: Alexandre Wavreille , Livio Lederer , Léon Ninane
- Applicant: PRAYON TECHNOLOGIES , Raphael Etienne Lederer , Robert Edouard Lederer
- Applicant Address: BE Engis; US AZ Scottsdale; US AZ Scottsdale
- Assignee: PRAYON TECHNOLOGIES,Raphael Etienne Lederer,Robert Edouard Lederer
- Current Assignee: PRAYON TECHNOLOGIES,Raphael Etienne Lederer,Robert Edouard Lederer
- Current Assignee Address: BE Engis; US AZ Scottsdale; US AZ Scottsdale
- Agency: Christensen O'Connor Johnson Kindness PLLC
- Priority: BE2017/5554 20170811
- International Application: PCT/EP2018/071818 WO 20180810
- International Announcement: WO2019/030403 WO 20190214
- Main IPC: C01B25/32
- IPC: C01B25/32

Abstract:
Process of acid attack with sulphuric acid of a phosphate source comprising calcium or not comprising calcium for a predetermined time period ranging from 20 to 180 minutes in the conditions wherein the molar ratio of sulphate from the sulphuric acid and possibly from the phosphate source to the calcium present in the phosphate source ranges from 0.6 to 0.8, and the content in P2O5 in the attack tank is of less than 6%.
Public/Granted literature
- US20200165133A1 METHOD FOR ETCHING A PHOSPHATE SOURCE USING ACID Public/Granted day:2020-05-28
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