Invention Grant
- Patent Title: Advanced electrodeposited copper foil having island-shaped microstructures and copper clad laminate using the same
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Application No.: US16905934Application Date: 2020-06-19
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Publication No.: US11408087B2Publication Date: 2022-08-09
- Inventor: Yun-Hsing Sung , Shih-Shen Lee , Hung-Wei Hsu , Chun-Yu Kao
- Applicant: CO-TECH DEVELOPMENT CORP.
- Applicant Address: TW Taipei
- Assignee: CO-TECH DEVELOPMENT CORP.
- Current Assignee: CO-TECH DEVELOPMENT CORP.
- Current Assignee Address: TW Taipei
- Agency: Li & Cai Intellectual Property Office
- Priority: TW109120638 20200618
- Main IPC: B32B15/00
- IPC: B32B15/00 ; C25D5/16 ; H05K1/03 ; C25D3/38

Abstract:
An advanced electrodeposited copper foil having island-shaped microstructures and a copper clad laminate using the same are provided. The advanced electrodeposited copper foil includes a micro-roughened surface. The micro-roughened surface has a plurality of copper crystals, a plurality of copper whiskers and a plurality of copper crystal groups which are in a non-uniform distribution and form into island-shaped patterns.
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