- Patent Title: Qualitative and quantitative analysis method for high molecular weight additive by using size-exclusion chromatography-pyrolysis-gas chromatography/mass spectrometry
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Application No.: US16963685Application Date: 2019-10-10
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Publication No.: US11408864B2Publication Date: 2022-08-09
- Inventor: Seonyoung Jegal , Byoung Hyoun Kim , Dong Hyun Kim , Yura Lee , Hyun Sik You
- Applicant: LG Chem, Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Priority: KR10-2018-0120966 20181011,KR10-2019-0124406 20191008
- International Application: PCT/KR2019/013248 WO 20191010
- International Announcement: WO2020/076075 WO 20200416
- Main IPC: G01N30/12
- IPC: G01N30/12 ; G01N30/86 ; G01N30/72

Abstract:
A method for securing qualitative and quantitative information of a high molecular weight additive in a polymer resin sample is disclosed herein. In some embodiments, the method includes separating a fraction of a polymer resin sample using size exclusion chromatography (SEC), wherein the fraction corresponding to a high molecular weight additive, pyrolyzing the fraction in a pyrolysis-gas chromatography/mass spectrometer (Py-GC/MS) to obtain a mass spectrum of the pyrolyzed fraction; identifying a structure of the high molecular weight additive by comparing m/z values for fragment peaks in the mass spectrum to m/z values for fragment peaks in a mass spectrum of a standard, and determining the amount of the high molecular weight additive in the polymer resin sample, relative to the total weight of the polymer resin sample by comparing a sum of areas of the fragment peaks to a calibration line of the standard.
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