- Patent Title: Hardmask composition, hardmask layer and method of forming patterns
-
Application No.: US16722720Application Date: 2019-12-20
-
Publication No.: US11409197B2Publication Date: 2022-08-09
- Inventor: Jaebum Lim , Sunghwan Kim , Seunghyun Kim , Taeho Kim , Yushin Park , Sunyoung Yang
- Applicant: SAMSUNG SDI CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: SAMSUNG SDI CO., LTD.
- Current Assignee: SAMSUNG SDI CO., LTD.
- Current Assignee Address: KR Yongin-si
- Agency: Lee IP Law, P.C.
- Priority: KR10-2018-0167677 20181221
- Main IPC: G03F7/11
- IPC: G03F7/11 ; C09D7/63 ; G03F7/30 ; G03F7/20 ; G03F7/16
Abstract:
A hardmask composition, a hardmask layer, and a method of forming patterns, the composition including a solvent; and a compound represented by Chemical Formula 1, wherein, in Chemical Formula 1, A is a C6 to C30 aromatic moiety, n is an integer of 2 or more, and each B is independently a group represented by Chemical Formula 2,
Information query
IPC分类:
