Invention Grant
- Patent Title: Method and data processing system for making machine learning model more resistent to adversarial examples
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Application No.: US16297955Application Date: 2019-03-11
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Publication No.: US11410078B2Publication Date: 2022-08-09
- Inventor: Joppe Willem Bos , Simon Johann Friedberger , Christiaan Kuipers , Vincent Verneuil , Nikita Veshchikov , Christine Van Vredendaal , Brian Ermans
- Applicant: NXP B.V.
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Agent Daniel D. Hill
- Main IPC: G06N20/00
- IPC: G06N20/00 ; H04L9/08 ; H04L9/32
Abstract:
A method and data processing system for making a machine learning model more resistant to adversarial examples are provided. In the method, an input for a machine learning model is provided. A randomly generated mask is added to the input to produce a modified input. The modified input is provided to the machine learning model. The randomly generated mask negates the effect of a perturbation added to the input for causing the input to be an adversarial example. The method may be implemented using the data processing system.
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