Invention Grant
- Patent Title: Lower electrode mechanism and reaction chamber
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Application No.: US16624246Application Date: 2017-11-15
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Publication No.: US11410833B2Publication Date: 2022-08-09
- Inventor: Yahui Huang , Gang Wei , Yicheng Li , Xingfei Mao
- Applicant: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Current Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Anova Law Group PLLC
- Priority: CN201710464985.7 20170619
- International Application: PCT/CN2017/111125 WO 20171115
- International Announcement: WO2018/233192 WO 20181227
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
The present disclosure provides a lower electrode mechanism and a reaction chamber, the lower electrode mechanism includes a base for carrying a workpiece to be processed and a lower electrode chamber disposed under the base, the lower electrode chamber includes an electromagnetic shielding space and a non-electromagnetic shielding space isolated from each other, the chamber of the lower electrode chamber includes a first through hole and a second through hole, and the electromagnetic shielding space and the non-electromagnetic shielding space are respectively connected to outside through the first through hole and the second through hole to prevent a plurality of first components disposed in the electromagnetic shielding space from being interfered by a second component disposed in the non-electromagnetic shielding space.
Public/Granted literature
- US20200321198A1 LOWER ELECTRODE MECHANISM AND REACTION CHAMBER Public/Granted day:2020-10-08
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