Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US17189700Application Date: 2021-03-02
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Publication No.: US11411075B2Publication Date: 2022-08-09
- Inventor: Gihee Cho , Sangyeol Kang , Jungoo Kang , Taekyun Kim , Jiwoon Park , Sanghyuck Ahn , Jin-Su Lee , Hyun-Suk Lee , Hongsik Chae
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Lee IP Law, P.C.
- Priority: KR10-2020-0094799 20200729
- Main IPC: H01L49/02
- IPC: H01L49/02 ; H01L27/108

Abstract:
A semiconductor device and a method of manufacturing the same, the device including a plurality of lower electrodes on a semiconductor substrate; a support pattern connecting the lower electrodes at sides of the lower electrodes; and a dielectric layer covering the lower electrodes and the support pattern, wherein each of the plurality of lower electrodes includes a pillar portion extending in a vertical direction perpendicular to a top surface of the semiconductor substrate; and a protrusion protruding from a sidewall of the pillar portion so as to be in contact with the support pattern, the pillar portion includes a conductive material, the protrusion includes a same conductive material as the pillar portion and is further doped with impurities.
Public/Granted literature
- US20220037461A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2022-02-03
Information query
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