Invention Grant
- Patent Title: Vapor deposition mask and vapor deposition device
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Application No.: US16981968Application Date: 2018-03-22
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Publication No.: US11414741B2Publication Date: 2022-08-16
- Inventor: Yoshifumi Ohta , Masao Nishiguchi
- Applicant: SHARP KABUSHIKI KAISHA
- Applicant Address: JP Sakai
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Sakai
- Agency: ScienBiziP, P.C.
- International Application: PCT/JP2018/011509 WO 20180322
- International Announcement: WO2019/180893 WO 20190926
- Main IPC: C23C14/04
- IPC: C23C14/04 ; H01L51/56 ; H01L51/00

Abstract:
A vapor deposition mask used to manufacture a display device includes a notch portion. The vapor deposition mask is provided with an FMM sheet and a first cover sheet. The first cover sheet includes a trunk portion and a notch forming portion that protrudes from the trunk portion and prevents film formation on the notch portion, and the thickness of at least a part of the notch forming portion is smaller than the thickness of the trunk portion.
Information query
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