Invention Grant
- Patent Title: Electrolytic chlorine dioxide gas manufacturing device
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Application No.: US16930949Application Date: 2020-07-16
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Publication No.: US11414767B2Publication Date: 2022-08-16
- Inventor: Kazuki Matsubara , Yasuhiro Takigawa , Kazuhiko Taguchi , Shigeo Asada , Kouichi Taura , Koichi Nakahara , Daisuke Kato
- Applicant: Taiko Pharmaceutical Co., Ltd.
- Applicant Address: JP Osaka
- Assignee: Taiko Pharmaceutical Co., Ltd.
- Current Assignee: Taiko Pharmaceutical Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Osha Bergman Watanabe & Burton LLP
- Priority: JPJP2014-182164 20140908
- Main IPC: C25B9/18
- IPC: C25B9/18 ; C25B1/26 ; C25B9/17 ; C25B9/19 ; C25B9/63 ; C25B15/02 ; C01B11/02

Abstract:
The present invention provides a chlorine dioxide manufacturing device that can accurately control the amount of chlorine dioxide produced. The present invention provides a chlorine dioxide gas manufacturing device comprising an electrolysis chamber, a liquid surface level measuring chamber, and a bubbling gas feeding device. The electrolysis chamber and the liquid surface level measuring chamber each comprises an electrolytic solution and a gas, wherein the electrolytic solution comprises an aqueous chlorite solution, and the electrolysis chamber and the liquid surface level measuring chamber are joined to each other above each liquid surface via a gas piping and joined to each other below each liquid surface via an electrolytic solution piping so that the height of the electrolytic solutions contained in each chamber are substantially equal.
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