Invention Grant
- Patent Title: Optical integrated device and production method therefor
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Application No.: US17055555Application Date: 2019-05-09
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Publication No.: US11415747B2Publication Date: 2022-08-16
- Inventor: Tai Tsuchizawa , Takuma Aihara
- Applicant: Nippon Telegraph and Telephone Corporation
- Applicant Address: JP Tokyo
- Assignee: Nippon Telegraph and Telephone Corporation
- Current Assignee: Nippon Telegraph and Telephone Corporation
- Current Assignee Address: JP Tokyo
- Agency: Slater Matsil, LLP
- Priority: JPJP2018-096888 20180521
- International Application: PCT/JP2019/018524 WO 20190509
- International Announcement: WO2019/225329 WO 20191128
- Main IPC: G02B6/122
- IPC: G02B6/122 ; G02B6/132 ; G02B6/12

Abstract:
Included are an optical waveguide including a first cladding layer formed on a substrate; a core formed on the first cladding layer; and a second cladding layer formed on the first cladding layer so as to cover the core. At least one of the first cladding layer and the second cladding layer is composed of a cladding material of silicon oxide containing deuterium atoms. The number of hydrogen atoms contained in the cladding material is smaller than the number of the deuterium atoms contained in the cladding material.
Public/Granted literature
- US20210181412A1 Optical Integrated Device and Production Method Therefor Public/Granted day:2021-06-17
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