- Patent Title: Microscope and method for determining an aberration in a microscope
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Application No.: US17080874Application Date: 2020-10-27
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Publication No.: US11415789B2Publication Date: 2022-08-16
- Inventor: Christian Schumann , Alexander Weiss , Andreas Lotter
- Applicant: Leica Microsystems CMS GmbH
- Applicant Address: DE Wetzlar
- Assignee: Leica Microsystems CMS GmbH
- Current Assignee: Leica Microsystems CMS GmbH
- Current Assignee Address: DE Wetzlar
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: EP19205882 20191029
- Main IPC: G02B21/00
- IPC: G02B21/00 ; G02B21/24 ; G02B27/00 ; G02B21/34

Abstract:
A microscope includes an optical imaging system with an adjustable corrector, a microscope drive, a position sensitive detector, an optical measuring system and a control unit. The optical measuring system configured to form first and second measuring light beams, direct the measuring light beams into an entrance pupil of the optical imaging system eccentrically with first and second distances to the optical axis thereof, receive first and second reflection light beams, and direct the reflection light beams onto the position sensitive detector. The control unit is configured to record positions of the reflection light beams on the position sensitive detector, and determine an aberration based on the recorded positions.
Public/Granted literature
- US20210124160A1 MICROSCOPE AND METHOD FOR DETERMINING AN ABERRATION IN A MICROSCOPE Public/Granted day:2021-04-29
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