An arrangement of a microlithographic imaging device, such as one that operates in the EUV range, includes a holding device for holding an optical element. The optical element includes an optical surface and defines a plane of main extension, in which the optical element defines a radial direction and a circumferential direction. The holding device includes a base unit and more than three separate holding units. The base unit includes a plurality of support interface units, which are spaced apart from one another in the circumferential direction, for connecting the holding device to a support structure. The holding units are connected to the base unit and distributed along the circumferential direction and spaced apart from one another. The holding units hold the optical element with respect to the base unit.