Invention Grant
- Patent Title: Imaging optical unit for EUV microlithography
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Application No.: US16933595Application Date: 2020-07-20
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Publication No.: US11422470B2Publication Date: 2022-08-23
- Inventor: Johannes Ruoff , Hubert Holderer
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102018201170.2 20180125
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An imaging optical unit for EUV microlithography is configured so that, when used in an optical system for EUV microlithography, relatively high EUV throughput and high imaging quality can achieved.
Public/Granted literature
- US20200348602A1 IMAGING OPTICAL UNIT FOR EUV MICROLITHOGRAPHY Public/Granted day:2020-11-05
Information query
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