Invention Grant
- Patent Title: Control of reticle placement for defectivity optimization
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Application No.: US16630508Application Date: 2018-06-28
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Publication No.: US11422478B2Publication Date: 2022-08-23
- Inventor: Andrew Judge , Aage Bendiksen , Pedro Julian Rizo Diago
- Applicant: ASML HOLDING N.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML HOLDING N.V.
- Current Assignee: ASML HOLDING N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2018/067361 WO 20180628
- International Announcement: WO2019/015930 WO 20190124
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A system designed to couple a patterning device to a support structure having a plurality of burls includes a camera module, an actuator, and a controller. The camera module is designed to capture image data of a backside of the patterning device. The actuator is coupled to at least one burl of the plurality of burls and is designed to move the at least one burl. The controller is designed to receive the image data captured from the camera module and determine one or more locations of contamination on the backside of the patterning device from the image data. The controller is also designed to control the actuator to move the at least one burl of the plurality of burls away from the one or more locations of contamination on the backside of the patterning device, based on the determined locations of contamination.
Public/Granted literature
- US20200166855A1 CONTROL OF RETICLE PLACEMENT FOR DEFECTIVITY OPTIMIZATION Public/Granted day:2020-05-28
Information query
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