Invention Grant
- Patent Title: Plasma reactor with electrode filaments extending from ceiling
-
Application No.: US15630833Application Date: 2017-06-22
-
Publication No.: US11424104B2Publication Date: 2022-08-23
- Inventor: Kenneth S. Collins , Michael R. Rice , Kartik Ramaswamy , James D. Carducci
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01L21/00
- IPC: H01L21/00 ; C23C16/00 ; H01J37/32 ; C23C16/507 ; C23C16/54 ; C23C16/509 ; C23C16/455 ; H01L21/67 ; H01L21/683 ; H01L21/687

Abstract:
A plasma reactor includes a chamber body having an interior space that provides a plasma chamber and having a ceiling, a gas distributor to deliver a processing gas to the plasma chamber, a pump coupled to the plasma chamber to evacuate the chamber, a workpiece support to hold a workpiece, and an intra-chamber electrode assembly. The intra-chamber electrode assembly includes an insulating frame, a first plurality of coplanar filaments that extend laterally through the plasma chamber between the ceiling and the workpiece support along a first direction, and a second plurality of coplanar filaments that extend in parallel through the plasma chamber along a second direction perpendicular to the first direction. Each filament of the first and second plurality of filaments includes a conductor at least partially surrounded by an insulating shell. A first RF power source supplies a first RF power to the conductor of the intra-chamber electrode assembly.
Public/Granted literature
- US20180308666A1 PLASMA REACTOR WITH ELECTRODE FILAMENTS EXTENDING FROM CEILING Public/Granted day:2018-10-25
Information query
IPC分类: