Invention Grant
- Patent Title: Semiconductor device including indium, silicon and carbon with varying concentrations
-
Application No.: US16769695Application Date: 2018-12-21
-
Publication No.: US11424329B2Publication Date: 2022-08-23
- Inventor: Dae Seob Han , Kwang Sun Baek , Young Suk Song
- Applicant: SUZHOU LEKIN SEMICONDUCTOR CO., LTD.
- Applicant Address: CN Taicang
- Assignee: SUZHOU LEKIN SEMICONDUCTOR CO., LTD.
- Current Assignee: SUZHOU LEKIN SEMICONDUCTOR CO., LTD.
- Current Assignee Address: CN Taicang
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: KR10-2017-0177663 20171222
- International Application: PCT/KR2018/016467 WO 20181221
- International Announcement: WO2019/125049 WO 20190627
- Main IPC: H01L29/36
- IPC: H01L29/36 ; H01L33/02

Abstract:
A semiconductor device including first to fourth points defined using In ion intensity, Si concentration, and C concentration obtained from SIMS data. The active layer of the device is a first region between the first point and the second point. In addition, the C concentration in a third region between the third point and the fourth point is higher than the C concentration in a second region adjacent to the fourth region along a second direction. Also, the Si concentration in the second region is higher than the Si concentration in the third region.
Public/Granted literature
- US20210367041A1 SEMICONDUCTOR DEVICE Public/Granted day:2021-11-25
Information query
IPC分类: