Invention Grant
- Patent Title: Copper-clad laminate
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Application No.: US15930899Application Date: 2020-05-13
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Publication No.: US11426976B2Publication Date: 2022-08-30
- Inventor: Junichi Nagata , Hironori Tanba
- Applicant: SUMITOMO METAL MINING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO METAL MINING CO., LTD.
- Current Assignee: SUMITOMO METAL MINING CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JPJP2019-182353 20191002
- Main IPC: B32B15/04
- IPC: B32B15/04 ; B32B15/08 ; B32B15/20 ; H05K3/38 ; C23C14/20 ; C23C14/02 ; C23C28/00 ; C23C30/00 ; C23C28/02 ; H05K1/03 ; H05K3/02

Abstract:
To provide a copper-clad laminate which maintains adhesion between a resin film and a conductor layer and which suppresses the occurrence of wrinkles. A copper-clad laminate has a base film containing a thermoplastic resin, an underlying metal layer film-formed on a surface of the base film by a dry plating method, and a copper layer film-formed on a surface of the underlying metal layer. The underlying metal layer has a mean thickness of 0.3 to 1.9 nm. Since the underlying metal layer has a mean thickness of 0.3 nm or more, it is possible to maintain adhesion between the base film and a conductor layer. Since the underlying metal layer has a mean thickness of 1.9 nm or less, it is possible to suppress an increase in the temperature of a film during film-forming of the underlying metal layer, and it is possible to suppress the occurrence of wrinkles.
Public/Granted literature
- US20210101366A1 COPPER-CLAD LAMINATE Public/Granted day:2021-04-08
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