Invention Grant
- Patent Title: High temperature rotation module for a processing chamber
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Application No.: US16017702Application Date: 2018-06-25
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Publication No.: US11427912B2Publication Date: 2022-08-30
- Inventor: Muhannad Mustafa , Muhammad M. Rasheed
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Main IPC: C23C16/458
- IPC: C23C16/458 ; C23C16/455 ; H01L21/687

Abstract:
Embodiments of substrate processing equipment and rotatable substrate supports incorporating the same are provided herein. In some embodiments, the substrate support may include a pedestal having a substrate receiving surface, a shaft having an upper end, a lower end, and a central opening, where the shaft is coupled to the pedestal at the upper end, a hub circumscribing the shaft, where the shaft is rotatable with respect to the hub, and where the hub includes a first port that extends from an outer surface of the hub to a volume between the hub and the shaft, and a ferrofluid sealing assembly disposed between the hub and the shaft.
Public/Granted literature
- US20190390337A1 HIGH TEMPERATURE ROTATION MODULE FOR A PROCESSING CHAMBER Public/Granted day:2019-12-26
Information query
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