Invention Grant
- Patent Title: Plasma generating apparatus and gas treating apparatus
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Application No.: US16479890Application Date: 2017-12-28
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Publication No.: US11430638B2Publication Date: 2022-08-30
- Inventor: Yun Soo Choi , Chan Kyoo Ko , Simone Magni
- Applicant: Edwards Korea Ltd.
- Applicant Address: KR Chungcheong-nam-do
- Assignee: Edwards Korea Ltd.
- Current Assignee: Edwards Korea Ltd.
- Current Assignee Address: KR Chungcheong-nam-do
- Agency: Shumaker & Sieffert, P.A.
- Priority: KR10-2017-0010393 20170123
- International Application: PCT/KR2017/015691 WO 20171228
- International Announcement: WO2018/135771 WO 20180726
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
A plasma generating apparatus may include a cathode assembly including a cathode, an anode assembly including an anode having therein a plasma generation space, and one or more magnetic force generators configured to generate a magnetic force. The anode assembly has one end portion in which a gas supply path is provided and the other end portion having an opening, the gas supply path configured to supply a plasma generating gas to the plasma generation space. The gas supply path is configured to generate a vortex of the plasma generating gas in the plasma generation space and said one or more magnetic force generators are arranged such that the magnetic force is generated in a direction opposite to a rotational direction of the vortex of the plasma generating gas.
Public/Granted literature
- US20210327687A1 PLASMA GENERATING APPARATUS AND GAS TREATING APPARATUS Public/Granted day:2021-10-21
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