Invention Grant
- Patent Title: Pedestal heater for spatial multi-wafer processing tool
-
Application No.: US17066971Application Date: 2020-10-09
-
Publication No.: US11430686B2Publication Date: 2022-08-30
- Inventor: Tejas Ulavi , Sanjeev Baluja , Dhritiman Subha Kashyap
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01T23/00
- IPC: H01T23/00 ; H01L21/683 ; H01L21/67
Abstract:
Substrate supports comprising a top plate positioned on a shaft are described. The top plate including a primary heating element a first depth from the surface of the top plate, a inner zone heating element a second depth from the surface of the top plate and an outer zone heating element a third depth from the surface of the top plate. Substrate support assemblies comprising a plurality of substrate supports and methods of processing a substrate are also disclosed.
Public/Granted literature
- US20210111058A1 Pedestal Heater for Spatial Multi-Wafer Processing Tool Public/Granted day:2021-04-15
Information query
