Invention Grant
- Patent Title: Deposition mask, mask member for deposition mask, method of manufacturing deposition mask, and method of manufacturing organic EL display apparatus
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Application No.: US16083524Application Date: 2016-07-22
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Publication No.: US11433484B2Publication Date: 2022-09-06
- Inventor: Hideo Takei , Susumu Sakio , Katsuhiko Kishimoto
- Applicant: HON HAI PRECISION INDUSTRY CO., LTD.
- Applicant Address: TW New Taipei
- Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
- Current Assignee Address: TW New Taipei
- Agency: ScienBiziP, P.C.
- Priority: JPJP2016-047209 20160310
- International Application: PCT/JP2016/071621 WO 20160722
- International Announcement: WO2017/154233 WO 20170914
- Main IPC: B23K26/362
- IPC: B23K26/362 ; H01L51/00 ; B23K26/38 ; C23C14/04

Abstract:
A deposition mask in which a resin film can be completely removed in opening portions, a method of manufacturing the deposition mask, and a mask member for the deposition mask are provided. A light irradiation source for laser light is disposed on one side of a resin film (11) and emits the laser light for forming a pattern of opening portions. A reflective film (30) is provided on another side of the resin film (11) and reflects light having a wavelength of the laser light emitted from the light irradiation source for the laser light. The laser light reflected by the reflective film (30) is used to form the patterns of the opening portion (11a) in the resin film (11).
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Information query
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