An imprint apparatus includes: a substrate stage configured to move a substrate; an ejection unit including a plurality of nozzles and configured to eject an ejection material from the nozzles onto the substrate in synchronization with movement of the substrate stage; and a mold driving mechanism configured to drive a mold on which a pattern is formed to press down the mold onto the substrate. The imprint apparatus determines a relative ejection timing of an abnormal nozzle with respect to a normal nozzle based on ejection properties of the nozzles and a moving direction of the substrate stage, determines an ejection timing of the normal nozzle based on the determined relative ejection timing, and controls a synchronization timing of the substrate stage and the ejection unit based on the determined ejection timing of the normal nozzle.