Invention Grant
- Patent Title: Composition and method for manufacturing a film comprising thiourethane layer
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Application No.: US17491783Application Date: 2021-10-01
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Publication No.: US11434336B2Publication Date: 2022-09-06
- Inventor: Sang Mook Kim , Sungjin Chung , Haksoo Lee
- Applicant: SKC Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: SKC Co., Ltd.
- Current Assignee: SKC Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2020-0128083 20201005,KR10-2020-0128085 20201005
- Main IPC: C08J5/18
- IPC: C08J5/18 ; C08G18/24 ; C08G18/75 ; C08G18/73 ; C08G18/38 ; C08G18/48 ; C08K5/134 ; B32B27/40 ; B32B27/30 ; B32B27/08 ; B32B27/22 ; B32B37/18 ; B32B3/26 ; B32B17/10

Abstract:
A film for glass bonding includes a thiourethane layer comprising a heterocyclo-alkanediyl-based repeat unit indicated by Formula 1, and a linear alkanediyl-based repeat unit indicated by Formula 2, and a base layer, disposed on a surface of the thiourethane layer, comprising a polyvinyl acetal resin and a plasticizer. In the Formula 1, R1 is —O— or —S—, and X is a heterocyclo-alkanediyl group having carbon atoms of 3 to 10 and sulfur atoms of 1 to 5, and in the Formula 2, R2 is —O— or —S—, and n2 is an integer of 4 to 10.
Public/Granted literature
- US20220106450A1 COMPOSITION AND METHOD FOR MANUFACTURING A FILM COMPRISING THIOURETHANE LAYER Public/Granted day:2022-04-07
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