Invention Grant
- Patent Title: Gas analysis device
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Application No.: US17245703Application Date: 2021-04-30
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Publication No.: US11435282B2Publication Date: 2022-09-06
- Inventor: Shinji Saito , Tsutomu Kakuno , Rei Hashimoto , Kei Kaneko
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2020-138661 20200819
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/03 ; G01N21/27 ; G01N21/39

Abstract:
According to one embodiment, a gas analysis device includes: a base including a concave portion; a window includes a first film and a second film; an optical part that is located at a side of the window opposite to the base side and includes a light projector and a light receiver; and an optical path length controller that is located between the base and the window and has a controllable thickness. The concave portion includes a first sidewall that is oblique to a surface of the base, and a second sidewall that is oblique to the surface of the base. An oblique direction of the second sidewall is opposite to an oblique direction of the first sidewall. The light projector is configured to irradiate light toward the first sidewall. The light receiver is configured to convert light reflected by the second sidewall.
Public/Granted literature
- US20220057319A1 GAS ANALYSIS DEVICE Public/Granted day:2022-02-24
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