Invention Grant
- Patent Title: Inspection method and inspection system
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Application No.: US17275626Application Date: 2019-08-27
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Publication No.: US11435392B2Publication Date: 2022-09-06
- Inventor: Osamu Arai , Hiroshi Kamiya
- Applicant: Kabushiki Kaisha Nihon Micronics
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Nihon Micronics
- Current Assignee: Kabushiki Kaisha Nihon Micronics
- Current Assignee Address: JP Tokyo
- Agency: Lorenz & Kopf, LLP
- Priority: JPJP2018-177401 20180921
- International Application: PCT/JP2019/033429 WO 20190827
- International Announcement: WO2020/059440 WO 20200326
- Main IPC: G01R31/28
- IPC: G01R31/28 ; G01R31/265 ; G01R1/073

Abstract:
An inspection method includes a step S20 of electrically connecting electrical signal terminals of a semiconductor device to electric connectors, and optically connecting optical signal terminals of the semiconductor device to optical connectors, a step S30 of measuring a test light output signal output from a monitoring element provided in an inspection object in response to a test input signal having been input to the monitoring element while adjusting conditions of a position and an inclination of the inspection object, and extracting conditions in which an optical intensity of the test light output signal is a predetermined determination value or greater as inspection conditions, and a step S40 of inspecting the semiconductor device under the inspection conditions.
Public/Granted literature
- US20220034959A1 INSPECTION METHOD AND INSPECTION SYSTEM Public/Granted day:2022-02-03
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