- Patent Title: Silicon carbide power diode device and fabrication method thereof
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Application No.: US16928373Application Date: 2020-07-14
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Publication No.: US11437525B2Publication Date: 2022-09-06
- Inventor: Yonghong Tao , Zhidong Lin , Zhigao Peng
- Applicant: HUNAN SANAN SEMICONDUCTOR CO., LTD.
- Applicant Address: CN Hunan
- Assignee: HUNAN SANAN SEMICONDUCTOR CO., LTD.
- Current Assignee: HUNAN SANAN SEMICONDUCTOR CO., LTD.
- Current Assignee Address: CN Hunan
- Agency: Stetina Brunda Garred & Brucker
- Priority: CN202010626793.3 20200701,CN202010626798.6 20200701,CN202021269885.2 20200701
- Main IPC: H01L29/872
- IPC: H01L29/872 ; H01L29/45 ; H01L29/66 ; H01L29/16

Abstract:
A silicon carbide power diode device has a silicon carbide substrate on which a silicon carbide epitaxial layer with an active region is provided. A Schottky metal layer is on the active region, and a first electrode layer is on the Schottky metal layer. A first ohmic contact is on the silicon carbide substrate, and a second electrode layer is on the first ohmic contact. The active region of the silicon carbide epitaxial layer has a plurality of first P-type regions, a plurality of second P-type regions, and N-type regions. The first P-type regions and the second P-type regions lacking an ohmic contact are spaced apart with dimensions of the second P-type regions being minimized and the N-type regions being maximized for given dimensions of the first P-type region. Second ohmic contacts are located between the first P-type region and the Schottky metal layer.
Public/Granted literature
- US20220005959A1 SILICON CARBIDE POWER DIODE DEVICE AND FABRICATION METHOD THEREOF Public/Granted day:2022-01-06
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