Invention Grant
- Patent Title: System and method for forming diffracted optical element having varied gratings
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Application No.: US16778631Application Date: 2020-01-31
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Publication No.: US11442207B2Publication Date: 2022-09-13
- Inventor: Morgan Evans , Rutger Meyer Timmerman Thijssen , Joseph Olson , Peter Kurunczi , Robert Masci
- Applicant: Varian Semiconductor Equipment Associates, Inc.
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Agency: KDB Firm PLLC
- Main IPC: G02B5/18
- IPC: G02B5/18 ; G11B7/1372 ; G11B7/1353 ; H01J37/30

Abstract:
Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates.
Public/Granted literature
- US20200166681A1 SYSTEM AND METHOD FOR FORMING DIFFRACTED OPTICAL ELEMENT HAVING VARIED GRATINGS Public/Granted day:2020-05-28
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