Invention Grant
- Patent Title: System and method for controlling the placement of fluid resist droplets
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Application No.: US15711400Application Date: 2017-09-21
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Publication No.: US11448958B2Publication Date: 2022-09-20
- Inventor: Colleen Lyons , Whitney Longsine , Matthew C. Traub , Van Nguyen Truskett
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agent Daniel Ratoff
- Main IPC: G03F7/16
- IPC: G03F7/16 ; G03F7/00

Abstract:
A fluid dispensing system, an imprint lithography system with a fluid dispensing system, a method of manufacturing an article with the fluid dispensing system. The fluid dispensing system comprising: a fluid dispenser and a heater. The fluid dispenser configured to dispense droplets of a fluid onto a substrate. The heater configured to maintain droplet temperature at greater than 23° C. Each of the droplets has a fluid volume that is less than 1.2 pL. The fluid dispenser is configured to have a drop placement accuracy for the imprint resist fluid that is less than a first threshold when the droplet fluid temperature is greater than 23° C. The drop placement accuracy is greater than the first threshold when the droplet fluid temperature is less than or equal to 23° C.
Public/Granted literature
- US20190086793A1 System and Method for Controlling the Placement of Fluid Resist Droplets Public/Granted day:2019-03-21
Information query
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