Invention Grant
- Patent Title: Stylus and processing method thereof
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Application No.: US17318149Application Date: 2021-05-12
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Publication No.: US11449170B2Publication Date: 2022-09-20
- Inventor: Shang-Tai Yeh
- Applicant: EGALAX_EMPIA TECHNOLOGY INC.
- Applicant Address: TW Taipei
- Assignee: EGALAX_EMPIA TECHNOLOGY INC.
- Current Assignee: EGALAX_EMPIA TECHNOLOGY INC.
- Current Assignee Address: TW Taipei
- Agency: WPAT, PC
- Priority: TW109117811 20200527
- Main IPC: G06F3/041
- IPC: G06F3/041 ; G06F3/044 ; G06F3/0354
Abstract:
A stylus processing method, comprising: receiving beacon signals via a tip electrode of a stylus; and during an i-th time slot of an j-th time period after the beacon signals are received, transmitting an j-th electrical signals via the tip electrode, where 1
Public/Granted literature
- US20210373731A1 STYLUS AND PROCESSING METHOD THEREOF Public/Granted day:2021-12-02
Information query
