Invention Grant
- Patent Title: Single crystal horizontal access device for vertical three-dimensional (3D) memory and method of forming 3D memory
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Application No.: US17035856Application Date: 2020-09-29
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Publication No.: US11450693B2Publication Date: 2022-09-20
- Inventor: Haitao Liu , Si-Woo Lee
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Brooks, Cameron & Huebsch, PLLC
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L21/223 ; H01L21/02

Abstract:
Systems, methods and apparatus are provided for an array of vertically stacked memory cells having horizontally oriented access devices having a first source/drain region and a second source drain region separated by a channel region, and gates opposing the channel region, vertically oriented access lines coupled to the gates and separated from a channel region by a gate dielectric. The memory cells have epitaxially grow single crystal silicon to fill the first horizontal opening and house a first source/drain in electrical contact with a conductive material and to form part of an integral, horizontally oriented, conductive digit line. The memory cells also have horizontally oriented storage nodes coupled to the second source/drain region and horizontally oriented digit lines coupled to the first source/drain region. A vertical body contact is formed in direct electrical contact with a body region of one or more of the horizontally oriented access devices and separate from the first source/drain region and the horizontally oriented digit lines by a dielectric.
Public/Granted literature
- US20220102394A1 SINGLE CRYSTAL HORIZONTAL ACCESS DEVICE FOR VERTICAL THREE-DIMENSIONAL (3D) MEMORY Public/Granted day:2022-03-31
Information query
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